Dependence of magnetic properties in superparamagnetic Co-granular thin films on deposition rate and effectiveness of a new pulsed DC reactive sputtering method for film fabrication with high deposition rate.

The superparamagnetic thin films with a granular structure show characteristic magnetization curve. In this study, Co-Al2O3 were fabricated by the sputtering method normal DC source for Co deposition, RF Al2O3 and pulsed reactive used fabrication of non-magnetic matrix oxide or nitride Al Si. As result, high could be obtained deposition rate. Very rate was Si using method. This 5 times larger than It is expected that will effective to realize very in films.